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Ossila/UV Ozone Cleaner/US/L2002A2-US

价格
¥39000.00
货号:L2002A2-US
浏览量:127
品牌:Ossila
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商品描述

ossila"sUVOzoneCleaneriscapableofremovingcontaminationonthesurfaceofsamples,providingyouwithultracleansurfaceswithinminutes.Byusingahigh-powerUVlightsource,ozoneisgenerated-whichthenbreaksdownsurfacecontaminantsintovolatilecompounds.Thesevolatilecompoundsevaporatefromthesurfaceleavingnotrace.Thismethodcanproducenear-atomicallycleansurfaceswithoutcausingdamagetothesample.


Features

 

 

Mercury Vapour Discharge Lamp

 

HighIntensityUVLamp

 

TheUVOzoneCleanerhousesahighintensitylowpressuremercuryvapourdischargelamp.Byutilizingtheemissionat185nmand254nmozonecanbegenerated.ThepresenceofozoneandUVlightallowfortheremovaloforganicsandsterilizesthesurface.

UV Ozone Cleaner Illumination Area

 

LargeCleaningArea

 

TheIlluminationareais100mmby100mmthisallowsforthecleaningofawidearrayofsamplesincluding:

Check MarkMicroscopeSlides
Check Mark4-InchWafer
Check MarkAFMTips
Check MarkDicedSubstrates
Check MarkPetriDishes
Check MarkAndMore
Simple To Use UV Ozone Cleaner

 

SimpletouseInterface

 

TheBrightdisplayandtactilekeypadprovideasimpleinterface,alongsidetheeasytousesoftwareitonlytakesashorttimetostartcleaningyoursamples.Inadditiontheinbuiltsoftwaremonitorsthetemperatureinsidethesystem,thisallowsyoutomakesuredelicatesamplesdonotoverheat.

 

AddedSafety

 

Ossila"sUVOzonecleanerhasbeendesignedwithsafetyinmind.AdheringtoBSEN61010-1:2010standardsalongsideEMC,LowVoltageandRoHSCEdirective.Thesystemprovidesuserswithaddedreassurancethattheequipmenttheyareusinghasbeenbuiltwithbothqualityandsafetyinmind.

Ossila Guarantee

 

TheOssilaGuarantee

 

Ossilaaimtohelpsimplifyresearchthatiswhywegiveafree2yearwarrantyonourequipment.Inadditionweofferrapiddispatchofitems,freeshippingonmanyorders,anddiscountsforlargepurchases.Ontopofthisweprovideexpertsupport,tutorials,andarangeofinformativeguides.


WhataretheusesofUVOzoneCleaning

UVOzonecleaningseesawiderangeofusesacrossmultipledisciplines,thetwomainusesforthetechniqueareforsurfacecleaningandsurfacetreatment.SurfacecleaningusingUVozonecleaningistypicallydoneasafinalstepinacleaningproceduretoremoveresidualorganicsthatarepresentonthesurfaceofasample.Theprocessresultsinanatomicallycleansurfacefreeformanyorganiccontaminants.

 

SurfacetreatmentusingUVOzoneisalsoapopularapplicationofthistechnique.DuringthecleaningprocesstheformationofozoneandoxygenrADIcalscanresultinreactionwithwatermoleculespresentintheair.Thisresultsintheformationofhydroxideradicals.Thesevaryshortlivedhighlyreactivespeciescanreactwithbondsonthesurfaceofsubstratesresultingintheformationofhighenergyhydroxidegroups.Thiscanhelpwithpreparationofsamplesbyincreasingthesurfaceenergyofasubstrate.

 

TherearealsootherapplicationsofUVOzonecleaningsuchassurfacesterilization,UVcuring,UVchemicalreactions,andmuchmore.FormoreinformationonthedifferentapplicationsanddetailedexamplesofhowUVOzonecleaningcanbeusedpleaseseeourapplicationstab

 


HowdoesUVOzoneCleaningWork?

UVOzonecleaningreliesupontheuseofahigh-intensityUVlightsourcewhichilluminatesthesurfacetobecleanedwithtwospecificwavelengthsoflight.Lowpressuremercuryvapourdischargelampsaretypicallyusedwhichhavetwodominantemissionpeaksat184nmand254nm.Uponirradiationmolecularoxygenpresentwithinairisdissociatedbyradiationbelow200nminlength.Thisresultsintheformationoftworadicalsofoxygen.Theseradicalsgoontoreactwithfurthermolecularoxygenformingmoleculesofozone.

 

Atthesametimelightat254nmisusedtoexciteorganicspeciespresentonthesurfaceofthesample.Thisprocessincreasesthereactivityofthecontaminantswithozone.Uponreactingthematerialiscleanedfromthesurface.FormoreinformationonthecleaningprocessandalsohowUVozonecleaningcanalterthesurfaceenergyofsubstratepleaseseeourtheorytabonthispage.

Specifications

UVlamptypeSyntheticQuartzUVGridLamp
UVlampdominantwavelengths185nmand254nm
UVlampdimensions100mmx100mm
UVlampcurrent30mA(constant)
254nmoutputintensity20µW/cm2atdistanceof100cm
UVlamplifetimeT80(2000hours);8-10yearsofstandarddailyuse
PowersupplyMains220-240VACFusedat1A
OptionalAC/ACAdapter110V/230V
Maxruntime59minutes59seconds
SafetyfeaturesSafetyinterlock,Hightemperaturewarning,thermalcutout
Substratetraysize100mmx100mm
Maximumrecommendedsubstratesize100mmx100mm
OverallDimensions

Width204mm

Height227mm

Depth300mm

*PleasenotethatthisUVOzoneCleanerdoesNOThaveanintegratedozonefiltrationsystem,andmustthereforebeoperatedinaworkingfumehood.


Datasheets

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UVLampSpectrum(Graphofrelativeintensityofemissionspectrum)

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UVLampLifetime(Graphofrelativeintensityoveroperationaltimeinhours)


ComplianceDocuments

document download icon

DeclarationofConformance(LowVoltageDirective,EMCDirective,RoHSDirective,andBSEN61010-1:2010)


UserManual

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UserManual

GeneralApplications

UVOzonecleaningisaversatiletechnique,itcanbeappliedtoawidearrayofmaterialstoprovidesurfacecleaningandtreatment.ItcanalsobeusedforavarietyofotherapplicationswhichrequireeitherthepresenceofozoneorUVlight.BelowisalistofcommonmaterialsthatcanbetreatedusingUVozonecleaning:

Quartz/Glass

Silicon/SiliconOxides

Metals(e.gGold,Silver,Steel)

TransparentConductors(ITO,FTO,IZO,AZO)

MetalOxides(e.gAluminiumOxide,TitaniumOxide)

III-VSemiconductors(e.gGalliumArsenide,SiliconNitride)

AFM/STMProbes

OpticalComponents

IfyouwouldliketoknowifyourmaterialissuitableforusewithUVOzonecleaningpleasefeelfreetocontactusatinfo@ossila.com.

UVOzonecleaningisaversatiletechniquenotonlycanitbeusedacrossawidearrayofmaterialsbutitcanalsobeusedtoperformavarietyofdifferenttasks.BelowisalistofsomeofthecommonapplicationsofUVOzonetreatment:

Surfacecleaning

UVcuring

Surfacesterilization

UVchemicalreactions

SurfaceTreatment

Removalofsurfacemonolayers

Oxidationofsurfaces

Micropatterning


ApplicationNotes

 

RemovalofSurfaceMonolayersandImprovingSurfaceHydrophilicity

 

InthisapplicationweusedtheUVozonecleanertoremoveasurfacelayerofn-octadecyltrichlorosilane(OTS)toimprovethewettingofwater-basedsolutionsonasiliconsubstrate.OTSisanorganicmoleculewhichisusedinthefabricationoforganicfieldeffecttransistorstoimprovetheelectricalpropertiesofdepositedfilms.OTSconsistsofatrichlorosilanegroupwhichreactswiththenativeoxideofsilicontoformthreesiloxanebondswiththesurface.ThesebondsrepeatacrossthesurfaceofthesiliconsubstrateuntiltheentiresurfaceiscoveredinamonolayerofOTS.Thelonghydrocarbonchainswhicharepresentresultinthesubstratehavingaverylowsurfaceenergy.

n-Octadecytrichlorosilane Molecule
Moleculeofn-octadecyltrichlorosilane(OTS).

Wettingofhighsurfaceenergysolvents,suchaswater,becomeimpossIBLeandthecontactangleofdepositeddropletsarethereforehigh.TheOTStreatedsubstratewasexposedtoUVozoneforapproximately10minutestocleanthesurfaceoftheoctadecanecarbonchains.BelowisanimageofawaterdropletpresentonthesurfaceofanOTStreatedsiliconsubstrateandanimageofadropletaftertreatment.Thetreatmenthasincreasedthesurfaceenergyenoughtoallowcompletewettingofthewaterdropletonthesubstratessurface.

High energy substrate surface before UV Ozone cleaningLow energy substrate surface after UV Ozone cleaning
WaterdroponOTS-treatedsiliconsubstrate(300nmSiO2onsurface)beforeUVozonecleaning(left)andafter10minutesUVozonecleaning(right).

SurfaceTreatmentofPMMASubstratestoReduceContactAngle

PlasticssubstrateshaveverylowsurfaceenergyduetotheabundanceofC-Hbondsandothersimilarlowenergybonds.Coatingthinfilmsfromsolutionsthathavehighsurfacetensionsolventscanbedifficultduetothepoorwettingthatoccurs.Onemethodtoassessthedegreeofwettingistolookatthecontactangleadropletmakesonthesurfaceoftehsusbtrate.Thelwoerthecontactanglethataparticularsovlentmakesthebetterthewettingit.UVozonecleaningcanbeusedtotreatthesurfacetoimprovethewettingofsolvents.

DuringtheprocessofUVozonetreatmentozonereactswithsurfacebondsbreakingdowntheorganicgroupsandeventuallyreleasingvolatilespecies.DuringtheprocessintermediatestepsoccurinwhichlowenergybondssuchastheC-HbondarereplacedwithhigherenergygroupssuchasC-OH.Thebelowfigureshowshowsurfacetreatmentcanbeusedtoimprovethesurfaceenergyofasubstrateandthatthelengthofexposuretoozonecanvarythedegreeofsurfaceenergychange.

Surface Treatment of PMMA Substrates Via UV Ozone Cleaning
ContactanglemeasuremetnsofwatertakenonPMMAsubstratesaftervaryinglengthsofUVOzoneexposuretime.

HowDoesUVOzoneCleanSamples?

 

UVozonecleaningisaphoto-sensitizedoxidationprocessinwhichorganicmoleculesintheirexcitedstatechemicallyreactwithozonemoleculesresultinginthecleavingofbondsandthedissociationofmoleculesfromthesurface.TheprocessutilizesahighintensityUVlightsourcewhichhastwodominantemissionpeaksat185nmand254nm.Thesetwowavelengthsareresponsiblefordifferentprocesseswhichultimatelyresultinthecleaningofthesurface.

Figure1.Videoshowingtheprocessofozoneformationandphoto-sensitizedoxidationoforganiccontaminants.

Radiationbelow200nmisstronglyabsorbedbymolecularoxygen,theenergyoftheabsorbedphotonisenoughtobreaktheoxygen-oxygendoublebondresultingintheformationoftwofreeradicalsofoxygen(O•).Thesefreeradicalscansubsequentlyreactwithmolecularoxygenproducingozonemolecules(O3).

UVradiationat254nmisreadilyabsorbedbyorganicspeciesthatarepresentonthesurfaceofmanysubstrates.Theexcitonthatisformedwillbeinahighlyenergeticstate,theenergymayalsobehighenoughforcertainmoleculestomakeorganicradicals.

Theexcitedstatesandorganicradicalspeciespresentonthesurfacereadilyreactwithozonepresentwithintheatmosphereresultingintheformationofvolatilespeciessuchascarbondioxide,water,molecularnitrogen,andshortchainorganiccompounds.Thesevolatilecompoundscaneasilydesorbfromthesurfaceunderatmosphericconditionsresultinginapristinesurface.

HowDoesUVOzoneAlterSurfaceEnergy?

UVOzonetreatmentaltersthesurfaceenergyofsamplesviatwomethods,thefirstoftheseisthroughtheremovaloflowenergycontaminantsfromthesurface.Thesearetypicallyorganicatmosphericcontaminantsthathaveadsorbedontothesurfaceofasubstrate.Thesecondwayisthroughtreatmentofthesurfaceandtheformationofhighenergybondsonthesurfaceofthesamples.

Theremovalofcontaminantsisdoneviathephoto-oxidationprocess,thisprocessresultsinthedesorptionofcontaminantsfromthesurfaceduetothechemicalbreakdownoftheorganicmaterial.Theunderlyingsubstrateistypicallyahigherenergysurfacesuchasaceramicorametalthisresultsinthesurfaceenergyofthesampleincreasingincomparisontowhenitwasuntreated.Thistreatmentdoesnotlastforeverasovertimeorganiccontaminantswillbegintoreabsorbbackontothesurfaceslowlydecreasingthesurfaceenergy.

ThesecondwaythatUVOzonetreatmentworkstoimprovethesurfaceenergyisviatheformationofhydroxylfunctionalgroupsonthesurfaceofthesubstrate.Duringtheirradiationprocesslightat253.7nmcanbreakdownwatermoleculesresultingintheformationofOHandOfreeradicals.HydroxylfreeradicalswilltypicallyreactwithozonepresenttoformwaterandOxygen,howeverwhentheUVdegradationofwateroccursnearthesurfaceofthesamplethehydroxylfreeradicalcanreactwiththesurfaceformingafunctionalgroup.Thisfunctionalgrouphasahighbondingenergyresultinginanincreaseinthesurfaceenergyofmostsurfaces.

Formoreinformationonthetheoryofsurfaceenergyandhowtocalculatesurfaceenergiespleasevisitoursurfaceenergyguidepage.

 


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Tothebestofourknowledgethetechnicalinformationprovidedhereisaccurate.However,OssilaassumenoliABIlityfortheaccuracyofthisinformation.Thevaluesprovidedherearetypicalatthetimeofmanufactureandmayvaryovertimeandfrombatchtobatch.

About Ossila Founded in 2009 by organic electronics research scientists, Ossila aims to provide the components, equipment, and materials to enable intelligent and efficient scientific research and discovery. Over a decade on, we're proud to supply our products to over 1000 different institutions in over 80 countries globally. With decades of academic and industrial experience in developing organic and thin-film LEDs, photovoltaics, and FETs, we know how long it takes to establish a reliable and efficient device fabrication and testing process. As such, we have developed coherent packages of products and services - enabling researchers to jump-start their organic electronics development program. The Ossila Guarantee Free Worldwide Shipping Eligible orders ship free to anywhere in the world Fast Secure Dispatch Rapid dispatch on in-stock items via secure tracked courier services Quality Assured Backed up by our free two year warranty on all equipment Clear Upfront Pricing Clear pricing in over 30 currencies with no hidden costs Large Order Discounts Save 8% on orders over $10,300.00 and 10% on orders over $12,900.00 Expert Support Our in-house scientists and engineers are always ready to help Trusted Worldwide Great products and service. Have already recommended to many people. Dr. Gregory Welch, University of Calgary Wonderful company with reasonably priced products and so customer-friendly! Shahriar Anwar, Arizona State University The Ossila Team Prof. David Lidzey - Chairman As professor of physics at the University of Sheffield, Prof. David Lidzey heads the university’s Electronic and Photonic Molecular Materials research group (EPMM). During his career, David has worked in both academic and technical environments, with his main areas of research including hybrid organic-inorganic semiconductor materials and devices, organic photonic devices and structures and solution processed photovoltaic devices. Throughout his academic career, he has authored over 220 peer-reviewed papers. Dr. James Kingsley - Managing Director James is a co-founder and managing director of Ossila. With a PhD in quantum mechanics/nanotech and over 12 years’ experience in organic electronics, his work on the fabrication throughput of organic photovoltaics led to the formation of Ossila and the establishment of a strong guiding ethos: to speed up the pace of scientific discovery. James is particularly interested in developing innovative equipment and improving the accessibility of new materials for solution-processable photovoltaics and hybrid organic-inorganic devices. Dr. Alastair Buckley - Technical Director Alastair is a lecturer of Physics at the University of Sheffield, specialising in organic electronics and photonics. He is also a member of the EPMM research group with a focus on understanding and applying the intrinsic advantages of functional organic materials to a range of optoelectronic devices. Alastair’s experience has not been gained solely in academia; he previously led the R&D team at MicroEmissive Displays and therefore has extensive technical experience in OLED displays. He is also the editor and contributor of "Organic Light-Emitting Diodes" by Elsevier. Our Research Scientists Our research scientists and product developers have significant experience in the synthesis and processing of materials and the fabrication and testing of devices. The vision behind Ossila is to share this experience with academic and industrial researchers alike, and to make their research more efficient. By providing products and services that take the hard work out of the device fabrication process, and the equipment to enable accurate, rapid testing, we can free scientists to focus on what they do best - science. Customer Care Team The customer care team is responsible for the customer journey at Ossila. From creating and providing quotes, through to procurement and inventory management, the customer care team is devoted to providing first class customer service. The general day to day responsibilities of a customer care team member involves processing customers orders and price queries, answering customer enquiries, arranging the shipment of parcels and notifying customers of updates on their orders. Collaborations and Partnerships Please contact the customer care team for all enquires, including technical questions about Ossila products or for advice on fabrication and measurement processes. Location and Facilities Ossila is based at the Solpro Business Park in Attercliffe, Sheffield. We operate a purpose-built synthetic chemistry and device testing laboratory on site, where all of our high-purity, batch-specific polymers and other formulations are made. This is complemented by a dedicated suite of thin-film and organic electronics testing and analysis tools within the device fabrication cluster housed in a class 1000 cleanroom in the EPSRC National Epitaxy Facility in Sheffield. All our electronic equipment is manufactured on-site.
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