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Low price, high purity 2D hexagonal boron nitride (h-BN) crystals and films
With a honeycomb structure based on sp2 covalent bonds similar to graphene, hexagonal boron nitride is also known as “white graphene”. h-BN monolayers have a layered structure (again, very similar to graphene).
The hexagonal crystal structure of h-BN is one of the three crystalline forms of boron nitride (BN). BN crystallises in hexagonal form at room temperature and normal pressure. It is the most stable phase of the three crystalline forms. At higher temperature and pressure, h-BN transform into a wurtzite structure (P63mc).
h-BN is normally considered an insulator, and is used as a sub-layer material for any other 2D material in electronic devices. However, it has exotic opto-electronic properties (e.g. wide bandgap and low dielectric constant) along with mechanical robustness, high thermal conductivity and chemical inertness. It was later confirmed to have an indirect bandgap (at 5.955 eV), and thus is also considered a semiconductor.
2D h-BN has no absorption in the visible range, but has absorption in the ultraviolet region with good photoluminescence.
Hexagonal boron nitride (h-BN) monolayer film has a similar lattice structure to graphene, with a lattice mismatch of only about 1.8%. h-BN and graphene are different in terms of their electrical conductivity. With a bandgap of 6.08 eV, h-BN has an insulating nature, whereas graphene is considered a semi-metal.
h-BN is widely used as a dielectric substrate in electronic and optical devices for graphene and other 2D-layered semiconductors (e.g. transition metal dichalcogenides TMDs).
Hexagonal boron nitride (h-BN) few-layer film, often referred to as h-BN nanosheets (h-BNNS), has an ultra-flat surface without dangling bonds. Due to its oxidation resistance even at high temperatures (up to 1000 oC) and chemical resistance to both acids and bases, it is believed to be a better substrate than silicon.
We supply low price hexagonal boron nitride (h-BN) in several different forms for a range of applications.
Hexagonal Boron Nitride Crystals
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Can be used for preparation of Hexagonal Boron Nitride nanoplates nano-platelets and ultrathinthin films
Available in Pack of 5 or 10 crystals
≥ 99.99% purity
From £395.00
Hexagonal Boron Nitride Films
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Can be used as substrate, dielectrics and passivation layers or interlayer to other 2D materials,
Monolayer and Few-Layer h-BN Films available on SiO2/Si or PET sunstrate*
≥ 99% purity
From £189.00
*Custom made size and substrates are also available
- Glass (1 cm × 1 cm, 1 cm × 2 cm, 2 cm × 2 cm or custom-made sizes)
- Sapphire (1 cm × 1 cm, 1 cm × 2 cm, 2 cm × 2 cm or custom-made sizes)
- Silicon (1 cm × 1 cm, 1 cm × 2 cm, 2 cm × 2 cm or custom-made sizes)
- Quartz (1 cm × 1 cm, 1 cm × 2 cm, 2 cm × 2 cm or custom-made sizes)
- Copper (5 cm × 10 cm or custom-made sizes)
Hexagonal boron nitride (h-BN) crystals are most commonly used as sources from which single or few-layer sheets can be obtained via either mechanical or liquid exfoliation.
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Perform electrical and optical measurements without expensive lithography equipment
- Platinum FET test chips optimized for 2D materials, just £149.00
- Developed with researchers in the field to speed up research
- Simplifies electrical measurements on small 2D crystals
- Transfer your crystal across the channel and start measuring
Find out more
h-BN has been used as a protective membrane in devices such as deep ultraviolet and quantum photonic emitters, where it provides strong oxidation resistance. It has also been utilised as a tunnelling barrier in field-effect tunnelling transistors.
Key Product Data
- High purity hexagonal boron nitride crystals and films
- Sold according to package or size and substrate respectively
- Low price with free worldwide shipping on qualifying orders
Synthesis and Usage
High quality monolayer and few-layer h-BN films were first grown directly on copper foil via the chemical vapour deposition (CVD) method. The films were later transferred to the desired substrates via the wet chemical transfer process.
h-BN films are ready to use in various research purposes, such as microscopic analysis, photoluminescence, and Raman spectroscopy studies. h-BN monolayer film can also be transferred to other substrates.
Structure and Properties of Hexagonal Boron Nitride
After exfoliation of Hexagonal Boron Nitride crystal or powder, Hexagonal Boron Nitride typically has the following properties:
- Known as “white graphene”
- BN crystallises in hexagonal form (P63mc)
- Normally considered an insulator
- With an indirect bandgap (at 5.955 eV), and thus is also considered a semiconductor
Applications of Hexagonal Boron Nitride
Thanks to its direct wide bandgap and ultraviolet luminescence property, exfoliated h-BN nano-sheets are a promising candidate for applications in ultraviolet lasers, photon emission, and DUV detectors. 2D h-BN also finds applications in FETs, quantum tunnelling transistors, thermoelectric devices, LEDs and solar cells.
Technical Data
CAS number | 10043-11-5 |
Full name | Hexagonal boron nitride |
Chemical formula | BN |
Molecular weight | 24.82 g/mol |
Bandgap | Indirect bandgap at 5.955 eV |
Preparation | Synthetic - Chemical Vapour Transport (CVT) |
Structure | Hexagonal (2H) |
Electronic properties | 2D Materials - insulator/semiconductor |
Melting point | 2,973 °C (sublimates) |
Colour | Colourless |
Synonyms | White graphene, hexagonal BN, h-BN |
Classification / Family | 2D materials, Organic electronics, Materials science |
Product Details
Form | Purity |
Hexagonal Boron Nitride Crystals | ≥ 99.99% |
Hexagonal Boron Nitride Films | ≥ 99% |
Monolayer Film
Substrate | SiO2/Si | PET |
Product code | M2161F11 | M2162F11 |
Size | 1 cm × 1 cm* | 1 cm × 1 cm* |
Growth Method | CVD synthesis | CVD synthesis |
Appearance | Transparent | Transparent |
Purity | > 99% | > 99% |
Transparency | > 97% | > 97% |
Coverage | > 95% | > 95% |
Number of Layers | 1 | 1 |
Sheet Resistance | n.a. | n.a. |
Transfer method | Wet chemical transfer | Wet chemical transfer |
Substrate Thickness | 300 nm | 250 µm |
MSDS |
Few-Layer Film
Substrate | SiO2/Si | PET |
Product code | M2163F11 | M2164F11 |
Size | 1 cm × 1 cm* | 1 cm × 1 cm* |
Growth Method | CVD synthesis | CVD synthesis |
Appearance | Transparent | Transparent |
Purity | > 99% | > 99% |
Transparency | > 97% | > 97% |
Coverage | > 95% | > 95% |
Number of Layers | 2-6 | 2-6 |
Sheet Resistance | n.a. | n.a. |
Transfer method | Wet chemical transfer | Wet chemical transfer |
Substrate Thickness | 300 nm | 250 µm |
MSDS |
MSDS Documents
Hexagonal Boron Nitride Crystals
Hexagonal Boron Nitride Monolayer Film on SiO2/Si
Hexagonal Boron Nitride Monolayer Film on PET
Hexagonal Boron Nitride Few-Layer Film on SiO2/Si
Hexagonal Boron Nitride Few-Layer Film on PET
Structure of Hexagonal Boron Nitride
With a honeycomb structure based on sp2 covalent bonds similar to graphene, hexagonal boron nitride is also known as “white graphene”. h-BN monolayers have a layered structure (again, very similar to graphene).
The hexagonal crystal structure of h-BN is one of the three crystalline forms of boron nitride (BN). BN crystallises in hexagonal form at room temperature and normal pressure. It is the most stable phase of the three crystalline forms. At higher temperature and pressure, h-BN transform into a wurtzite structure (P63mc).
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Applications of Hexagonal Boron Nitride
Few-layer h-BN can be achieved either by physical, thermal, or liquid phase exfoliation, Like graphite, its layer-by-layer structure is held together by van der Waals forces.
The optical band gap of monolayer h-BN is found to be 6.07 eV, while few-layer h-BN has bandgaps ranging from 5.56 to 5.92 eV, depending on the number of layers. Thanks to its direct wide bandgap and ultraviolet luminescence property, exfoliated h-BN nano-sheets are a promising candidate for applications in ultraviolet lasers, photon emission, and DUV detectors. 2D h-BN also finds applications in FETs, quantum tunnelling transistors, thermoelectric devices, LEDs and solar cells.
Due to its special chemical properties and electronic structure, h-BN often serves as an atomic flat insulating substrate or a tunneling dielectric barrier in graphene and other 2D electronics. Like graphene, h-BN exhibits excellent mechanical flexibility, chemical and temperature stability, and high thermal conductivity. h-BN has been used as a protective membrane in devices such as deep ultraviolet and quantum photonic emitters, where it provides strong oxidation resistance. It has also been utilised as a tunnelling barrier in field-effect tunnelling transistors.
Pricing Table (All)
Form | Package/Substrates* | Product Code | Price |
Crystals | Pack of 5 Crystals | M2133A1 | £395.00 |
Crystals | Pack of 10 Crystals | M2133C1 | £675.00 |
Monolayer Films | SiO2/Si - 2 Each | M2161F11 | £189.00 |
Monolayer Films | SiO2/Si - 4 Each | M2161F11 | £323.00 |
Monolayer Films | PET - 2 Each | M2162F11 | £189.00 |
Monolayer Films | PET - 4 Each | M2162F11 | £323.00 |
Few-Layer Films | SiO2/Si - 2 Each | M2163F11 | £189.00 |
Few-Layer Films | SiO2/Si - 4 Each | M2163F11 | £323.00 |
Few-Layer Films | PET - 2 Each | M2164F11 | £189.00 |
Few-Layer Films | PET - 4 Each | M2164F11 | £323.00 |
*typical representative size, areas/dimensions may vary
**item with a lead time of 4-6 weeks, please contact for more information
Shipping is free for qualifying orders.
Literature and Reviews
- Hexagonal boron nitride is an indirect bandgap semiconductor, G. Cassabois et al., Nat. Photon., 10, 262–266 (2016);DOI: 10.1038/NPHOTON.2015.277.
- Graphene, hexagonal boron nitride, and their heterostructures: properties and applications, J. Wang et al., RSC Adv., 7, 16801 (2017); DOI: 10.1039/c7ra00260b.
- Two dimensional hexagonal boron nitride (2D-h-BN): synthesis, properties and applications, K. Zhang et al., J. Mater. Chem. C, 5, 11992 (2017); DOI: 10.1039/c7tc04300g.
- Synthesis and Applications of Two-Dimensional Hexagonal Boron Nitride in Electronics Manufacturing, J. Bao et al., Electron. Mater. Lett., 12, 1-16 (2016), DOI: 10.1007/s13391-015-5308-2.
- Functionalized hexagonal boron nitride nanomaterials: emerging properties and applications, Q. Weng et al., Chem. Soc. Rev., 45, 3989-4012 (2016); DOI:10.1039/C5CS00869G.
- Atomically Thin Boron Nitride: Unique Properties and Applications, L. Li et al., Adv. Funct. Mater., 26, 2594-2608 (2016); DOI: 10.1002/adfm.201504606 .
- Large-scale synthesis and functionalization of hexagonal boron nitride nanosheets, G. Bhimanapati et al., anoscale, 6, 11671-11675 (2014); DIO: 10.1039/C4NR01816H.
- Large Scale Thermal Exfoliation and Functionalization of Boron Nitride, Z. Cui et al., small, 10 (12), 2352–2355 (2014); DOI: 10.1002/smll.201303236.
- White Graphene undergoes Peroxidase Degradation, R. Kurapati et al., Angew.Chem., 128,5596 –5601 (2016); DOI:10.1002/anie.201601238.
- Layer speciation and electronic structure investigation of freestanding hexagonal boron nitride nanosheets, J. Wang et al., Nanoscale, 7, 1718-1724 (2015); DOI: 10.1039/C4NR04445B.
- Monolayer to Bulk Properties of Hexagonal Boron Nitride, D. Wickramaratne et al., J. Phys. Chem. C, 122 (44), 25524–25529 (2018); DOI: 10.1021/acs.jpcc.8b09087.
- Atomically Thin Boron Nitride: Unique Properties and Applications, L. Li et al, Adv. Funct. Mater., 26, 2594-2608 (2016); DOI: 10.1002/adfm.201504606.
- Chemical and Bandgap Engineering in Monolayer Hexagonal Boron Nitride, K. Ba et al., Sci. Rep., 7, 45584 (2017); DOI: 10.1038/srep45584.
- Single Crystalline Film of Hexagonal Boron Nitride Atomic Monolayer by Controlling Nucleation Seeds and Domains, Q. Wu et al., Sci. Rep., 5, 16159 (2015); DOI: 10.1038/srep16159,
- Growth of Large Single-Crystalline Monolayer Hexagonal Boron Nitride by Oxide-Assisted Chemical Vapor Deposition, R. Chang et al., Chem. Mater. 2017, 29, 6252−6260 (2017); DOI: 10.1021/acs.chemmater.7b01285.
- Scalable Synthesis of Uniform Few-Layer Hexagonal Boron Nitride Dielectric Films, P Sutter et al., Nano Lett. 2013, 13, 276−281 (2013); DIO: 10.1021/nl304080y.
- High-performance deep ultraviolet photodetectors based on few-layer hexagonal boron nitride, H, Liu et al., Nanoscale, 10, 5559–5565 (2018); DOI: 10.1039/c7nr09438h .
- Pressure-Dependent Growth of Wafer-Scale Few-layer h‑BN by Metal−Organic Chemical Vapor Deposition, D. Kim et al., Cryst. Growth Des., 17, 2569−2575 (2017); DOI: 10.1021/acs.cgd.7b00107.
- Catalyst-Free Bottom-Up Synthesis of Few-Layer Hexagonal Boron Nitride Nanosheets, J. Nanomater., 30429 (2015); doi: 10.1155/2015/304295.
- Controlled Synthesis of Atomically Layered Hexagonal Boron Nitride via Chemical Vapor Deposition, J. Liu et al., Molecules, 21, 1636 (2016); doi:10.3390/molecules21121636.
- Thickness determination of few-layer hexagonal boron nitride films by scanning electron microscopy and Auger electron spectroscopy, APL Mater. 2, 092502 (2014); doi.org/10.1063/1.4889815.
- Vacuum-Ultraviolet Photodetection in Few-Layered h‑BN, W. Zheng et al., ACS Appl. Mater. Interfaces, 10, 27116−27123 (2018); DOI: 10.1021/acsami.8b07189.
To the best of our knowledge the technical information provided here is accurate. However, Ossila assume no liability for the accuracy of this information. The values provided here are typical at the time of manufacture and may vary over time and from batch to batch.
About Ossila Founded in 2009 by organic electronics research scientists, Ossila aims to provide the components, equipment, and materials to enable intelligent and efficient scientific research and discovery. Over a decade on, we're proud to supply our products to over 1000 different institutions in over 80 countries globally. With decades of academic and industrial experience in developing organic and thin-film LEDs, photovoltaics, and FETs, we know how long it takes to establish a reliable and efficient device fabrication and testing process. As such, we have developed coherent packages of products and services - enabling researchers to jump-start their organic electronics development program. The Ossila Guarantee Free Worldwide Shipping Eligible orders ship free to anywhere in the world Fast Secure Dispatch Rapid dispatch on in-stock items via secure tracked courier services Quality Assured Backed up by our free two year warranty on all equipment Clear Upfront Pricing Clear pricing in over 30 currencies with no hidden costs Large Order Discounts Save 8% on orders over $10,300.00 and 10% on orders over $12,900.00 Expert Support Our in-house scientists and engineers are always ready to help Trusted Worldwide Great products and service. Have already recommended to many people. Dr. Gregory Welch, University of Calgary Wonderful company with reasonably priced products and so customer-friendly! Shahriar Anwar, Arizona State University The Ossila Team Prof. David Lidzey - Chairman As professor of physics at the University of Sheffield, Prof. David Lidzey heads the university’s Electronic and Photonic Molecular Materials research group (EPMM). During his career, David has worked in both academic and technical environments, with his main areas of research including hybrid organic-inorganic semiconductor materials and devices, organic photonic devices and structures and solution processed photovoltaic devices. Throughout his academic career, he has authored over 220 peer-reviewed papers. Dr. James Kingsley - Managing Director James is a co-founder and managing director of Ossila. With a PhD in quantum mechanics/nanotech and over 12 years’ experience in organic electronics, his work on the fabrication throughput of organic photovoltaics led to the formation of Ossila and the establishment of a strong guiding ethos: to speed up the pace of scientific discovery. James is particularly interested in developing innovative equipment and improving the accessibility of new materials for solution-processable photovoltaics and hybrid organic-inorganic devices. Dr. Alastair Buckley - Technical Director Alastair is a lecturer of Physics at the University of Sheffield, specialising in organic electronics and photonics. He is also a member of the EPMM research group with a focus on understanding and applying the intrinsic advantages of functional organic materials to a range of optoelectronic devices. Alastair’s experience has not been gained solely in academia; he previously led the R&D team at MicroEmissive Displays and therefore has extensive technical experience in OLED displays. He is also the editor and contributor of "Organic Light-Emitting Diodes" by Elsevier. Our Research Scientists Our research scientists and product developers have significant experience in the synthesis and processing of materials and the fabrication and testing of devices. The vision behind Ossila is to share this experience with academic and industrial researchers alike, and to make their research more efficient. By providing products and services that take the hard work out of the device fabrication process, and the equipment to enable accurate, rapid testing, we can free scientists to focus on what they do best - science. Customer Care Team The customer care team is responsible for the customer journey at Ossila. From creating and providing quotes, through to procurement and inventory management, the customer care team is devoted to providing first class customer service. The general day to day responsibilities of a customer care team member involves processing customers orders and price queries, answering customer enquiries, arranging the shipment of parcels and notifying customers of updates on their orders. Collaborations and Partnerships Please contact the customer care team for all enquires, including technical questions about Ossila products or for advice on fabrication and measurement processes. Location and Facilities Ossila is based at the Solpro Business Park in Attercliffe, Sheffield. We operate a purpose-built synthetic chemistry and device testing laboratory on site, where all of our high-purity, batch-specific polymers and other formulations are made. This is complemented by a dedicated suite of thin-film and organic electronics testing and analysis tools within the device fabrication cluster housed in a class 1000 cleanroom in the EPSRC National Epitaxy Facility in Sheffield. All our electronic equipment is manufactured on-site.