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Glen research/def-dA-CE Phosphoramidite/1kit/10-1504-10

价格
¥1200.00
货号:10-1504-10
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品牌:Glen research
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Technical Documents

Safety Data Sheet

Glen Report 28.14: New Product - Depurination Resistant dA-CE Phosphoramidite


Description

Depurination is defined as the cleavage of the glycosidic bond attaching a purine base to the sugar moiety.Electron withdrawing acyl protecting groups like benzoyl and isobutyryl on the purine amino group(s) destabilize the glycosidic bond, whereas electron donating formamidine protecting groups stabilize the glycosidic bond.The consequence of depurination during oligonucleotide synthesis is the loss of the purine base to form an internucleotide linkage containing the abasic sugar at that position. This site is stable during further synthesis cycles but, upon deprotection with basic reagents, the oligonucleotide is cleaved at that position leading to two shorter fragments. The fragment towards the 5’ terminus still contains the DMT group. If DMT-ON purification is being used, the depurinated fragments are co-purified along with the full length product as truncated oligonucleotides.The most commonly used dA-CE Phosphoramidite containing benzoyl protecting groups suffers substantial degradation by depurination after excessive exposure to TCA.At the same time, two depurination resistant dA monomers, protected with diethylformamidine (def) and dimethylacetamidine (dma), are essentially stable to depurination during the same exposure to TCA.Both new depurination resistant dA monomers (def and dma protected), were rapidly deprotected in ammonium hydroxide and are fully compatible with regular deprotection strategies.Def-protected-dA was rapidly deprotected with AMA at 65° in 20 minutes, which makes it fully compatible with regular AMA deprotection.In contrast, thedma-protected-dA required 80 minutes with AMA at 65° for complete deprotection.Dmf-dG is also a depurination resistant CE Phosphoramidite with the isobutyryl group of the original monomer replaced with dimethylformamidine (dmf).Although depurination does occur in regular oligonucleotide synthesis, the degradation is at an extremely low level.However in certain other circumstances, depurination may become more significant, such as synthesis of long oligos, chip-based synthesis, and large-scale synthesis

Details

Usage

  • Coupling: No changes needed from standard method recommended by synthesizer manufacturer.
  • Deprotection:  In 30% ammonium hydroxide, deprotect for 2 hours at 65 °C. In 30% Ammonium Hydroxide/40% Methylamine 1:1 (AMA), synthesize using acetyl-protected dC (10-1015-xx) and deprotect at 65 °C for 20 minutes.
Specifications
DiluentAnhydrous Acetonitrile
StorageRefrigerated storage, maximum of 2-8°C, dry and in the dark
Stability1-2 Days

Dilution/Coupling Data

The table below show pack size data and, for solutions, dilution and approximate coupling based on normal priming procedures.

ABI 392/394

Catalog #Pack SizeGrams/Pack0.1M Dil. (mL)Approximate Number of Additions
LV40LV20040nm0.2μm1μm10μm
10-1504-020.25 g.25grams2.9986.3351.832.3823.5517.274.32
10-1504-050.5 g.5grams5.97185.67111.469.6350.6437.139.28
10-1504-101.0 g1grams11.95385231144.381057719.25

Expedite

Catalog #Pack SizeGrams/PackDilution (mL)Approximate Number of Additions
Molarity50nm0.2μm1μm15μm
10-1504-020.25 g.25grams4.460.0782.851.7537.645.18
10-1504-050.5 g.5grams8.920.07172107.578.1810.75
10-1504-101.0 g1grams17.830.07350.2218.88159.1821.89


Glen research表观遗传学是生物学和癌症研究中发展最快的领域之一。虽然基本的遗传密码定义了合成哪些蛋白质和基因产物,但表观遗传控制定义了它们何时何地表达。基因表达的这种动态控制对于X染色体失活,胚胎发生,细胞分化至关重要,并且似乎是记忆形成和突触可塑性的组成部分。在2009年,两份报告1,2  中所述5-羟甲基-2'-脱氧胞苷的发现(HMDC),浦肯野神经元和胚胎干细胞的新颖的DC修饰。后来,第三份报告发现这种修饰在与较高认知功能相关的脑组织中高度丰富。3 dC修饰是通过α-酮戊二酸依赖性十一种11易位(TET)酶的作用产生的,该酶将5-Me-dC氧化为hmdC。这一发现激发了关于可能通过例如碱基切除修复(BER)借助专门的DNA糖基化酶发生的活性脱甲基途径的讨论。或者,可以设想一种方法,其中将hmdC的羟甲基进一步氧化为5-甲酰基-dC(fdC)或5-羧基-dC(cadC),然后消除甲酸或二氧化碳4,5。Glen Research自成立以来就一直为这项研究提供支持,为合成包含所有新dC衍生物-hmdC,fdC和cadC的寡核苷酸提供了基础。第一代hmdC亚磷酰胺已被广泛接受,但需要相当苛刻的脱保护条件。因此,介绍了由Carell和同事开发的与UltraMild脱保护兼容的第二代构建基(5-Hydroxymethyl-dC II)。6  5-甲酰基-dC III旨在满足制备包含所有甲基化变体的寡核苷酸的所有要求。